Rokitski, Slava: search on Z-Library

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1

Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling

Fomenkov, Igor, Brandt, David, Ershov, Alex, Schafgans, Alexander, Tao, Yezheng, Vaschenko, Georgiy, Rokitski, Slava, Kats, Michael, Vargas, Michael, Purvis, Michael, Rafac, Rob, La Fontaine, Bruno, D

Journal:

Advanced Optical Technologies

Language:

english

File:

PDF, 1.06 MB

english

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - An intelligent imaging system for ArF scanner

Matsuyama, Tomoyuki, Ohmura, Yasuhiro, Nakashima, Toshiharu, Uehara, Yusaku, Ogata, Taro, Nishinaga, Hisashi, Ikezawa, Hironori, Toki, Tsuyoshi, Rokitski, Slava, Bonafede, James

Year:

2008

Language:

english

File:

PDF, 634 KB

english, 2008

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Performance optimization of MOPA pre-pulse LPP light source

Wood, Obert R., Panning, Eric M., Schafgans, Alexander A., Brown, Daniel J., Fomenkov, Igor V., Sandstrom, Rick, Ershov, Alex, Vaschenko, Georgiy, Rafac, Rob, Purvis, Michael, Rokitski, Slava, Tao, Ye

Year:

2015

Language:

english

File:

PDF, 955 KB

english, 2015

4

SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing

Rokitski, Slava, Chen, Alek C., Han, Woo-Sung, Ishihara, Toshi, Rao, Rajeskar, Lin, Burn J., Yen, Anthony, Jiang, Rui, Riggs, Daniel, Haviland, Mary, Cacouris, Theodore, Brown, Daniel

Year:

2009

Language:

english

File:

PDF, 303 KB

english, 2009

5

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Advancements in predictive plasma formation modeling

Panning, Eric M., Goldberg, Kenneth A., Purvis, Michael A., Schafgans, Alexander, Brown, Daniel J. W., Fomenkov, Igor, Rafac, Rob, Brown, Josh, Tao, Yezheng, Rokitski, Slava, Abraham, Mathew, Vargas,

Year:

2016

File:

PDF, 609 KB

2016

6

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - XLR 600i: recirculating ring ArF light source for double patterning immersion lithography

Fleurov, Vladimir, Rokitski, Slava, Bergstedt, Robert, Ye, Hong, O’Brien, Kevin, Jacques, Robert, Trintchouk, Fedor, Figueroa, Efrain, Cacouris, Theodore, Brown, Daniel, Partlo, William

Year:

2008

Language:

english

File:

PDF, 482 KB

english, 2008

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

Panning, Eric M., Goldberg, Kenneth A., Schafgans, Alexander A., Brown, Daniel J., Fomenkov, Igor V., Tao, Yezheng, Purvis, Michael, Rokitski, Slava I., Vaschenko, Georgiy O., Rafac, Robert J., Brandt

Year:

2017

Language:

english

File:

PDF, 114 KB

english, 2017

8

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Advancements in predictive plasma formation modeling

Panning, Eric M., Goldberg, Kenneth A., Purvis, Michael A., Schafgans, Alexander, Brown, Daniel J. W., Fomenkov, Igor, Rafac, Rob, Brown, Josh, Tao, Yezheng, Rokitski, Slava, Abraham, Mathew, Vargas,

Year:

2016

Language:

english

File:

PDF, 609 KB

english, 2016

9

Big lasers, tiny circuits

Rokitski, Slava

Journal:

Year:

2010

Language:

english

File:

PDF, 342 KB

english, 2010

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Enhancing lithography process control through advanced, on-board beam parameter metrology for wafer level monitoring of light source parameters

Choi, Jinphil, Seong, Nakgeuon, Zurita, Omar, Thornes, Joshua, Won, Yookeun, Rokitski, Slava, Kang, Youngseog, Burfeindt, Bernd, Park, Chanhoon, Conley, Will

Year:

2012

Language:

english

File:

PDF, 2.26 MB

english, 2012

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